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Volumn 55, Issue 6, 2008, Pages 1502-1510

Hot-electron capture for CHEI programming in SONOS-type flash memory using high- κ trapping layer

Author keywords

Channel hot electron injection (CHEI); High ; Hot electron capture; Polysilicon oxide nitride oxide silicon (SONOS) Flash memory

Indexed keywords

CHARGE TRAPPING; HOT ELECTRONS; SEMICONDUCTING SILICON COMPOUNDS; ZIRCONIA;

EID: 44949206685     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2008.922854     Document Type: Article
Times cited : (11)

References (28)
  • 1
    • 46049118849 scopus 로고    scopus 로고
    • Investigation of the low-field leakage through high-k interpoly dielectric stacks and its impact on nonvolatile memory data retention
    • B. Govoreanu, D. Wellekens, L. Haspeslagh, J. De Vos, and J. Van Houdt, "Investigation of the low-field leakage through high-k interpoly dielectric stacks and its impact on nonvolatile memory data retention," in IEDM Tech. Dig., 2006, p. 479.
    • (2006) IEDM Tech. Dig , pp. 479
    • Govoreanu, B.1    Wellekens, D.2    Haspeslagh, L.3    De Vos, J.4    Van Houdt, J.5
  • 2
    • 0021483045 scopus 로고
    • Lucky-electron model of channel hot-electron injection in MOSFETs
    • Sep
    • S. Tam, P.-K. Ko, and C.-M. Hu, "Lucky-electron model of channel hot-electron injection in MOSFETs," IEEE Trans. Electron Devices, vol. ED-31, no. 9, pp. 1116-1125, Sep. 1984.
    • (1984) IEEE Trans. Electron Devices , vol.ED-31 , Issue.9 , pp. 1116-1125
    • Tam, S.1    Ko, P.-K.2    Hu, C.-M.3
  • 4
    • 33645728372 scopus 로고    scopus 로고
    • Lateral profiling of trapped charge in SONOS flash EEPROMS programmed using CHE injection
    • Apr
    • P. B. Kumar, P. R. Nair, R. Sharma, S. Kamohara, and S. Mahapatra, "Lateral profiling of trapped charge in SONOS flash EEPROMS programmed using CHE injection," IEEE Trans. Electron Devices, vol. 53, no. 4, pp. 698-705, Apr. 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.4 , pp. 698-705
    • Kumar, P.B.1    Nair, P.R.2    Sharma, R.3    Kamohara, S.4    Mahapatra, S.5
  • 5
    • 0346898527 scopus 로고
    • Non-equilibrium electron-phonon scattering in semiconductor heterojunctions
    • Dec
    • W. Cai, M. Lax, and M. C. Marchetti, "Non-equilibrium electron-phonon scattering in semiconductor heterojunctions," Phys. Rev. B, Condens. Matter, vol. 34, no. 12, pp. 8573-8580, Dec. 1986.
    • (1986) Phys. Rev. B, Condens. Matter , vol.34 , Issue.12 , pp. 8573-8580
    • Cai, W.1    Lax, M.2    Marchetti, M.C.3
  • 6
    • 0021371288 scopus 로고
    • Electron temperature dependences of nonradiative multiphoton hot-electron capture coefficients of deep traps in semiconductor. I: Small lattice relaxation
    • R. Passler, "Electron temperature dependences of nonradiative multiphoton hot-electron capture coefficients of deep traps in semiconductor. I: Small lattice relaxation," Solid State Electron. vol. 27, no. 2, p. 155, 1984.
    • (1984) Solid State Electron , vol.27 , Issue.2 , pp. 155
    • Passler, R.1
  • 9
    • 0035872897 scopus 로고    scopus 로고
    • High-kappa gate dielectrics: Current status and materials properties considerations
    • G. D. Wilk, R. M. Wallace, and J. M. Anthony, "High-kappa gate dielectrics: Current status and materials properties considerations," J. Appl. Phys, vol. 89, no. 10, p. 5243, 2001.
    • (2001) J. Appl. Phys , vol.89 , Issue.10 , pp. 5243
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 10
    • 17944375332 scopus 로고    scopus 로고
    • 2 interface for sub-0.1 μm complementary metal-oxide-semiconductor gate oxide stacks: A valence band and quantitative core-level study hy soft X-ray photoelectron spectroscopy
    • Dec
    • 2 interface for sub-0.1 μm complementary metal-oxide-semiconductor gate oxide stacks: A valence band and quantitative core-level study hy soft X-ray photoelectron spectroscopy," J. Appl. Phys, vol. 96, no. 11, pp. 6362-6369, Dec. 2004.
    • (2004) J. Appl. Phys , vol.96 , Issue.11 , pp. 6362-6369
    • Barrett, N.1    Renault, O.2    Damlencourt, J.-F.3    Martin, F.4
  • 15
    • 0017907780 scopus 로고
    • Temperature dependences of the nouradiative multiphoton carrier capture and ejection properties of deep traps in semiconductors. I. Theoretical results
    • Jan
    • R. Passler, "Temperature dependences of the nouradiative multiphoton carrier capture and ejection properties of deep traps in semiconductors. I. Theoretical results," Phys. Stat, Sol. B, vol. 85, no. 1, pp. 203-215, Jan. 1978.
    • (1978) Phys. Stat, Sol. B , vol.85 , Issue.1 , pp. 203-215
    • Passler, R.1
  • 16
    • 0019528691 scopus 로고
    • Temperature, dependences of the nonradiative multiphoton carrier capture and ejection properties of deep traps in semiconductors. II. Interpretation and extrapolation of capture data
    • Feb
    • R. Passler, "Temperature, dependences of the nonradiative multiphoton carrier capture and ejection properties of deep traps in semiconductors. II. Interpretation and extrapolation of capture data," Phys. Stat. Sol. B, vol. 103, no. 2, pp. 673-686, Feb. 1981.
    • (1981) Phys. Stat. Sol. B , vol.103 , Issue.2 , pp. 673-686
    • Passler, R.1
  • 17
  • 19
    • 0024985779 scopus 로고
    • Charge transport and storage of low programming voltage SONOS/MONOS memory devices
    • Jan
    • F. R. Libsch and M. H. White, "Charge transport and storage of low programming voltage SONOS/MONOS memory devices," Solid State Electron., vol. 33, no. 1, pp. 105-126, Jan. 1990.
    • (1990) Solid State Electron , vol.33 , Issue.1 , pp. 105-126
    • Libsch, F.R.1    White, M.H.2
  • 20
    • 10644273634 scopus 로고    scopus 로고
    • A transient analysis method to charactclize the trap vertical location in nitride-trapping devices
    • Dec
    • H.-T. Lue, Y.-H. Shih, K.-Y. Hsieh, R. Liu, and C.-Y. Lu "A transient analysis method to charactclize the trap vertical location in nitride-trapping devices," IEEE Electron Device Lett., vol. 25, no. 12, pp. 816-818, Dec. 2004.
    • (2004) IEEE Electron Device Lett , vol.25 , Issue.12 , pp. 816-818
    • Lue, H.-T.1    Shih, Y.-H.2    Hsieh, K.-Y.3    Liu, R.4    Lu, C.-Y.5
  • 21
    • 38349035934 scopus 로고    scopus 로고
    • Spatial distribution of charge traps in SONOS-type flash memory using high-k trapping layer
    • Dec
    • G. Zhang, X.-P. Wang, W. J. Yoo, and M.-F. Li, "Spatial distribution of charge traps in SONOS-type flash memory using high-k trapping layer," IEEE trans. Electron Devices, vol. 54, no. 12, pp. 3177-3324, Dec. 2007.
    • (2007) IEEE trans. Electron Devices , vol.54 , Issue.12 , pp. 3177-3324
    • Zhang, G.1    Wang, X.-P.2    Yoo, W.J.3    Li, M.-F.4
  • 23
    • 0000513694 scopus 로고
    • Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor deposition
    • Aug
    • G. N. Parsons, J. H. Souk, and J. Batey, "Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor deposition," J. Appl. Phys., vol. 70, no. 3, pp. 1553-1560, Aug. 1991.
    • (1991) J. Appl. Phys , vol.70 , Issue.3 , pp. 1553-1560
    • Parsons, G.N.1    Souk, J.H.2    Batey, J.3
  • 24
    • 0342882187 scopus 로고    scopus 로고
    • Stability of hydrogen in silicon nitride films deposited by low-pressure and plasma enhanced chemical vanor deposition techniques
    • J. Z. Xic, S. P. Murarka, X. S. Guo, and W. A. Lanford, "Stability of hydrogen in silicon nitride films deposited by low-pressure and plasma enhanced chemical vanor deposition techniques," J. Vac Sci. Technol. B, Microelectron. Process. Phenom., vol. 7, no. 2, p. 150, 1999.
    • (1999) J. Vac Sci. Technol. B, Microelectron. Process. Phenom , vol.7 , Issue.2 , pp. 150
    • Xic, J.Z.1    Murarka, S.P.2    Guo, X.S.3    Lanford, W.A.4
  • 25
    • 0032203132 scopus 로고    scopus 로고
    • XPS and AFM study of chemical mechanical polishing of silicon nitride
    • Nov
    • G.-R. Yang, Y.-P. Zhao, Y. Z. Hu, T. P. Chow, and R. J. Gutmann, "XPS and AFM study of chemical mechanical polishing of silicon nitride," Thin Solid Films, vol. 333, no. 1/2, pp. 219-223, Nov. 1998.
    • (1998) Thin Solid Films , vol.333 , Issue.1-2 , pp. 219-223
    • Yang, G.-R.1    Zhao, Y.-P.2    Hu, Y.Z.3    Chow, T.P.4    Gutmann, R.J.5
  • 26
    • 21644484957 scopus 로고    scopus 로고
    • High-k HfA10 charge trapping layer in SONOS-type non-volatile, memory device for high speed operation
    • Y. N. Tan, W. K. Chim, W. K. Choi, M. S. Joo, T. H. Ng, and B. J. Cho, "High-k HfA10 charge trapping layer in SONOS-type non-volatile, memory device for high speed operation " in IEDM Tech, Dig., 2004, pp. 889-892.
    • (2004) IEDM Tech, Dig , pp. 889-892
    • Tan, Y.N.1    Chim, W.K.2    Choi, W.K.3    Joo, M.S.4    Ng, T.H.5    Cho, B.J.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.