Zr O2 film interfaces with Si and Si O2

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Lopez, C M ^a   Suvorova, N A ^a   Irene, E A ^a   Suvorova, A A ^b   Saunders, M ^b  

^a University of North Carolina at Chapel Hill   (United States)

^b UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

MASS SPECTROMETRY OF RECOILED IONS (MSRI); PHOTON ENERGY; SPECTROSCOPIC ELLIPSOMETRY; THERMAL OXIDATION;

ELLIPSOMETRY; INTERFACES (MATERIALS); MASS SPECTROMETRY; OPTICAL PROPERTIES; OXIDATION; PHOTONS; REACTION KINETICS; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIUM COMPOUNDS;

THIN FILMS;

EID: 23944460061     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1994938     Document Type: Article

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