Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C4F8 plasmas

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 6028-6032

  Furuya, Kenji ^a   Nakanishi, Ryoichi ^a   Okumura, Hiroshi ^a   Makita, Makoto ^a   Harata, Akira ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

AFM; C4F8; Fluorocarbon film; Low k material; Plasma polymerization; Surface structure; XPS

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; DEPOSITION RATES; FLUORINE CONTAINING POLYMERS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

AL SUBSTRATES; FLUOROCARBON FILMS; LOW K MATERIALS; POLYMERIC PERFLUOROCARBON;

FLUOROCARBONS;

EID: 44449137115     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.112     Document Type: Article

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