Plasma copolymerization of C6F6/C5F 8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ fourier transform infrared spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2697-2703

  Shirafuji, Tatsuru ^a   Tsuchino, Akio ^a   Nakamura, Toshihiro ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Aromatic carbon ring; C5F8; C6F6; Chemical vapor deposition; Copolymerization; Low dielectric constant; Plasma; Porous; Thermal stability

Indexed keywords

CARBON; COPOLYMERIZATION; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEATING; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS MATERIALS; THERMODYNAMIC STABILITY; ULSI CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

AROMATIC CARBON RINGS; C5F8; C6F6; LOW DIELECTRIC CONSTANT;

AMORPHOUS FILMS;

EID: 3142666996     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2697     Document Type: Article

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