The preparation and properties of nanostructured diamond films deposited by a hot-filament chemical vapor deposition method via continuous ion bombardment

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 4-9

  Liu, Wei ^a,b   Gu, Changzhi ^b  

^a INSTITUTE OF PHYSICS   (China)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Diamond; Field emission; Ion bombardment; Nanostruotures; Stress

Indexed keywords

BIAS ENHANCED NUCLEATION (BEN); HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); NANOSTRUCTURED DIAMOND FILMS;

CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; MIRRORS; NANOSTRUCTURED MATERIALS; POLISHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS;

DIAMONDS;

EID: 4444324091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.029     Document Type: Article

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