메뉴 건너뛰기




Volumn 7, Issue 7, 1998, Pages 1017-1020

Analysis of heteroepitaxial mechanism of diamond grown by chemical vapor deposition

Author keywords

Bias treatment; Heteroepitaxial mechanism

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; EPITAXIAL GROWTH; SILICON WAFERS;

EID: 0032116510     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(98)00154-X     Document Type: Article
Times cited : (20)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.