Highly stressed carbon film coatings on silicon: Potential applications

Applied Physics Letters

Volumn 80, Issue 16, 2002, Pages 2880-2882

  Sharda, T ^a   Soga, T ^a   Jimbo, T ^a   Umeno, M ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BENT CRYSTALS; CARBON FILM COATINGS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM; NANOCRYSTALLINE DIAMOND FILMS; POTENTIAL APPLICATIONS; SI SUBSTRATES;

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE SILICON; PLASMA DEPOSITION;

DIAMOND FILMS;

EID: 79956002568     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1471379     Document Type: Article

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