Study of the degradation of plasma-oxidized polystyrene by time- and angle-resolved x-ray photoelectron spectroscopy

Surface and Interface Analysis

Volumn 35, Issue 6, 2003, Pages 502-514

  Tremblay, M C ^a   Paynter, R W ^b  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

^b INRS EMT   (Canada)

Author keywords

ARXPS; Oxygen plasma; Polystyrene; X ray degradation; XPS

Indexed keywords

ALUMINUM; DEGRADATION; MAGNESIUM PRINTING PLATES; MATHEMATICAL MODELS; OXIDATION; OXYGEN; PHOTOEMISSION; PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; OXYGEN CONCENTRATION DEPTH PROFILES; OXYGEN PLASMA; PLASMA OXIDISED POLYSTYRENE;

POLYSTYRENES;

EID: 0037789555     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1564     Document Type: Article

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