Controlled deposition of SiO2 nanoparticles of NIST-traceable particle sizes for mask surface inspection system characterization

IEEE Transactions on Semiconductor Manufacturing

Volumn 21, Issue 2, 2008, Pages 238-243

  Yook, Se Jin ^a   Fissan, Heinz ^b   Engelke, Thomas ^b   Asbach, Christof ^b   Van Der Zwaag, Till ^b   Kim, Jung Hyeun ^c   Eschbach, Florence ^d   Wang, Jing ^e   Pui, David Y H ^e  

^a Hanyang University   (South Korea)

^b Institute of Energy and Environmental Technology   (Germany)

^c University of Seoul   (South Korea)

^d INTEL CORPORATION   (United States)

^e University of Minnesota   (United States)

Author keywords

Monodisperse particle generation; Nanoparticles; NIST traceable particle size; Particle deposition on masks; SiO2 particles

Indexed keywords

CONTAMINATION; DEPOSITION; LITHOGRAPHY; PARTICLE SIZE; SILICON COMPOUNDS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MONODISPERSE PARTICLE GENERATION; NIST-TRACEABLE PARTICLE SIZE; PARTICLE DEPOSITION ON MASKS;

NANOPARTICLES;

EID: 43849094970     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2000266     Document Type: Conference Paper

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