Technical Note: Concepts for protection of EUVL masks from particle contamination

Journal of Nanoparticle Research

Volumn 8, Issue 5, 2006, Pages 705-708

  Asbach, Christof ^a   Fissan, Heinz ^b   Kim, Jung Hyeun ^b   Yook, Se Jin ^c   Pui, David Y H ^c  

^a Institute of Energy and Environmental Technology   (Germany)

^b University of Seoul   (South Korea)

^c UNIVERSITY OF MINNESOTA   (United States)

Author keywords

Electrophoresis; EUVL mask; Nanoelectronics; Nanoparticle contamination; Thermophoresis

Indexed keywords

ATMOSPHERIC PRESSURE; CONTAMINATION; ELECTROPHORESIS; ELEMENTARY PARTICLES; NANOSTRUCTURED MATERIALS; THERMOPHORESIS; ULTRAVIOLET RADIATION;

NANOELECTRONICS; NANOPARTICLE CONTAMINATION; SEMICONDUCTOR CHIPS; ULTRAVIOLET LITHOGRAPHY (EUVL);

LITHOGRAPHY;

EID: 33751016815     PISSN: 13880764     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11051-006-9080-y     Document Type: Article

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