Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 4, 2006, Pages 1844-1849

  Kim, Jung Hyeun ^a   Fissan, Heinz ^b   Asbach, Christof ^b   Yook, Se Jin ^c   Wang, Jing ^c   Pui, David Y H ^c  

^a University of Seoul   (South Korea)

^b Institute of Energy and Environmental Technology)   (Germany)

^c University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIAL PRESSURE; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) TECHNOLOGY; ORGANIC MEMBRANE PELLICLES; PARTICLE CONTAMINATION;

DEPOSITION; ELECTROPHORESIS; IMPURITIES; LITHOGRAPHY; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE; STANDARDS; THERMOPHORESIS;

REVERSE ENGINEERING;

EID: 33746567944     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2214712     Document Type: Article

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