Clean mask shipping module development and demonstration for EUVL masks and blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Yan, Pel Yang ^a   He, Long ^b   Ma, Andy ^b   Orvek, Kevin ^a  

^a INTEL CORPORATION   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENCHMARKING; LIGHT ABSORPTION; LITHOGRAPHY; SEMICONDUCTOR MATERIALS; ULTRAVIOLET RADIATION;

CLEAN MASK SHIPPING MODULE DEVELOPMENT; EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL); MASK CARRIERS;

MASKS;

EID: 33748036404     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681847     Document Type: Conference Paper

References (3)

1. S. J. Yook, J. H. Kim, C. Asbach, H. Fissan, D. Y. H. Pui, A. Ramamoorthy, and P. Y. Yan, "Design and Preliminary Results of an Atmospheric Chamber to Evaluate Nanoparticle Protection Schemes for EUVL Carrier System," http://www.sematech.org/resources/litho/meetings/euvl/ 20041101euvl/index.htm. 3rd International Workshop on Extreme Ultraviolet Lithography, Japan Nov. 2004.
2. A. S. Geller and C. C. Walton, "Improved Reticle Carrier Design Through Numerical Simulation," http://www.sematech.org/resouroes/litho/ meetings/euvl/20041101euvyindex.htm. 3rd International Workshop on Extreme Ultraviolet Lithography, Japan Nov. 2004.
3. E. Tejnil, E. M. Gullikson, and A. R. Stivers, "Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography." Proc. SPIE 5567, 943 (2004)