Numerical evaluation of protection schemes for EUVL masks in carrier systems against horizontal aerosol flow

Journal of the Electrochemical Society

Volumn 154, Issue 3, 2007, Pages

  Engelke, Thomas ^a   Van Der Zwaag, Till ^a   Asbach, Christof ^a   Fissan, Heinz ^a   Hyeun Kim, Jung ^b   Yook, Se Jin ^c   Pui, David Y H ^c  

^a Institute of Energy and Environmental Technology   (Germany)

^b University of Seoul   (South Korea)

^c UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; ATMOSPHERIC PRESSURE; CONTAMINATION; ELECTRIC EQUIPMENT PROTECTION; ELEMENTARY PARTICLES; NUMERICAL METHODS;

AEROSOL FLOW; CARRIER SYSTEMS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PHOTOMASKS;

MASKS;

EID: 33847001316     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2426744     Document Type: Article

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