|
Volumn 24, Issue 2, 2006, Pages 229-234
|
Speed-controlled particle injection into a low-pressure system
|
Author keywords
[No Author keywords available]
|
Indexed keywords
EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) MASKS;
LOW-PRESSURE SYSTEMS;
PARTICLE INJECTION;
CONTAMINATION;
LITHOGRAPHY;
SPEED CONTROL;
THERMOPHORESIS;
ULTRAVIOLET DEVICES;
MASKS;
|
EID: 33644527293
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2165660 Document Type: Article |
Times cited : (6)
|
References (15)
|