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Volumn 87, Issue 23, 2005, Pages 1-3

Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks

Author keywords

[No Author keywords available]

Indexed keywords

COULOMB FORCE; GRAVITATIONAL SETTLING; ULTRAVIOLET LITHOGRAPHY MASK;

EID: 28444477314     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2140475     Document Type: Article
Times cited : (14)

References (17)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.