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Volumn 87, Issue 23, 2005, Pages 1-3
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Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks
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Author keywords
[No Author keywords available]
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Indexed keywords
COULOMB FORCE;
GRAVITATIONAL SETTLING;
ULTRAVIOLET LITHOGRAPHY MASK;
ELECTROPHORESIS;
GRAVITATIONAL EFFECTS;
THERMOPHORESIS;
ULTRAVIOLET DETECTORS;
LITHOGRAPHY;
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EID: 28444477314
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2140475 Document Type: Article |
Times cited : (14)
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References (17)
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