Protection schemes for critical surface in vacuum environments

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1319-1324

  Kim, Jung Hyeun ^a   Asbach, Christof ^a   Yook, Se Jin ^a   Fissan, Heinz ^b   Orvek, Kevin J ^c   Ramamoorthy, Arun ^c   Yan, Pei Yang ^c   Pui, David Y H ^a  

^a University of Minnesota   (United States)

^b Institute of Energy and Environmental Technology)   (Germany)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL SURFACE; PARTICLE FORMATION;

CONDENSATION; MASKS; SEMICONDUCTOR MATERIALS;

VACUUM PUMPS;

EID: 29044436577     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1978890     Document Type: Article

References (10)

1. P. Borden, Microcontamination Feb., 43 (1991).
2. P. Borden, Microcontamination Mar., 39 (1991).
3. D. Greenstein, H. Yang, A. Tao, P. Kinney, J. Zhao, A. Gupta, and B. Fishkin, Microcontamination Mar., 21 (1991).
4. P. D. Hoh, J. Vac. Sci. Technol. A 2, 198 (1984).
5. G. Strasser, H. P. Bader, and M. E. Bader, J. Vac. Sci. Technol. A 8, 4092 (1990).
6. D. Chen and Susan Hackwood, J. Vac. Sci. Technol. A 8, 933 (1990).
7. J. Zhao, Ph.D thesis, University of Minnesota, 1990.
8. Y. Ye, B. Y. H. Liu, and D. Y. H. Pui, J. Electrochem. Soc. 140, 1463 (1993).
9. Y. Ye, Ph.D thesis, University of Minnesota, 1992.
10. W. C. Hinds, Aerosol Technology, 2nd ed. (Wiley, New York, 1999), pp. 278-281.