Height and sidewall angle SEM metrology accuracy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 1212-1223

  Kris, R ^a   Adan, O ^a   Tam, A ^a   Karabekov, A ^a   Menadeva, O ^a   Peltinov, R ^a   Pnueli, A ^a   Zoran, O ^a   Vilenkin, A ^b  

^a Applied Materials Inc Israel   (Israel)

^b HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

3D Metrology; Accuracy; CD Metrology; Monte Carlo simulations; SEM

Indexed keywords

3D METROLOGY; ACCURACY; CRITICAL DIMENSION (CD); SHAPE CONTROL;

CAPACITORS; COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; MEASUREMENT THEORY; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; STATISTICAL PROCESS CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4344670574     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537938     Document Type: Conference Paper

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