Characterisation of 193nm resist layers by CD-SEM sidewall imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 892-900

  Marschner, Thomas ^a   Stief, Christian ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Applied Materials   (Germany)

Author keywords

193nm resist; 3D profile reconstruction; CD metrology; CD SEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; IMAGE PROCESSING; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SPATIAL VARIABLES MEASUREMENT; SURFACES; THREE DIMENSIONAL;

FOCUS EXPOSURE MATRIX; PROFILE RECONSTRUCTION; THREE DIMENSIONAL PROFILE RECONSTRUCTION;

PHOTORESISTS;

EID: 0141723579     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482808     Document Type: Conference Paper

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