3D imaging of isolated lines of negative e-beam resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 1074-1083

  Eckert, Andrew ^a   Gentile, Harold ^a   Mountfield, Keith ^a   Seiler, Carl ^a   Yang, XiaoMin ^a   Johns, Earl ^a  

^a SEAGATE RESEARCH   (United States)

Author keywords

3D SEM imaging; Data storage; E beam lithography; Nanofabrication; Profile reconstruction; Proximity effect; Resolution; Thin film heads

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; IMAGE RECONSTRUCTION; MAGNETIC RECORDING; MAGNETIC STORAGE; NANOTECHNOLOGY;

PROFILE RECONSTRUCTION; PROXIMITY EFFECT;

ELECTRON BEAMS;

EID: 0141724555     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482323     Document Type: Conference Paper

References (5)

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2. B. Bunday, M. Bishop, M. H. Bennett, J. Swyers, Z. Haberman-Golan, Quantitative Profile-Shape Measurement Study on a CD-SEM with application to etch bias control, SPIE Microlithography Conference 2002, Proc. SPIE 4689 2002.
3. R. Peltinov, T. Pan, O. Dror, New approach for mapping and monitoring damascene trench depth using CD-SEM tilt imaging., SPIE Microlithography Conference 2002, Proc. SPIE 4689, 2002.
4. I. Laufer, G. Eytan, O. Dror, Three Dimensional aspects of the shrinking phenomenon of ArF resist, SPIE Microlithography Conference, 2002, Proc. SPIE 4689, 2002.
5. Keith Mountfield, future publication.