Three dimensional top down metrology: A viable alternative to AFM or cross section?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 366-376

  Solecky, E ^a   Archie, C ^a   Hayes, T ^a   Banke, B ^a   Cornell, R ^a  

^a IBM   (United States)

Author keywords

Atomic force microscopy (AFM); Critical dimension (CD); Scanning electron microscopy (SEM); Sidewall angle

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEGREES OF FREEDOM (MECHANICS); PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION (CD);

IMAGING TECHNIQUES;

EID: 0034758424     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436762     Document Type: Conference Paper

References (3)

1. Contact holes: A challenge for signal collection efficiency and measurement algorithms
2. Modeling and experimental aspects of apparent beam width as an edge resolution measure
3. CD SEM edge width applications and analysis