The influence of non-uniform target poisoning on the energy distributions of atoms sputtered in a reactive dc magnetron discharge

Plasma Sources Science and Technology

Volumn 17, Issue 2, 2008, Pages

  Guttler D ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BINDING ENERGY; DC MACHINERY; GAS MIXTURES; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITROGEN COMPOUNDS; SPUTTER DEPOSITION;

ENERGY RESOLVED MASS SPECTROMETRY; SPUTTERED ENERGY DISTRIBUTIONS; SPUTTERED PARTICLES;

TITANIUM COMPOUNDS;

EID: 43149096473     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/2/025016     Document Type: Article

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