Study and control of both target-poisoning mechanisms and reactive phenomenon in reactive planar magnetron cathodic sputtering of TiN

Surface and Coatings Technology

Volumn 82, Issue 1-2, 1996, Pages 145-157

  Combadiere, L ^a   Machet, J ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Magnetron sputtering; Target poisoning; Thin films; Titanium nitride

Indexed keywords

COATINGS; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; NITRIDING; SUBSTRATES; THIN FILMS;

TARGET POISONING;

TITANIUM NITRIDE;

EID: 0030190455     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02671-1     Document Type: Article

References (27)

1. W.D. Sproul, P. Rudnick, C.A. Gogol, Thin Solid Films, 171 (1989) 171-181.
2. T. Larsson, H.O. Blom, C. Nender and S. Berg, J. Vac. Sci. Technol. A, 6(3) (1988) 1832-1836.
3. D.K. Hohnke, D.J. Schmatz and M.D. Hurley, Thin Solid Films, 118 (1984) 301-310.
4. J. Schiller, G. Beister and W. Sieber, Thin Solid Films, 111 (1984) 259-268.
5. A. Okamoto and T. Serikawa, Thin Solid Films, 137 (1986) 143-151.
6. S. Kadlec, J. Musil and H. Vyskocil, J. Phys. D, 19 (1986) L187.
7. A.F. Hmiel, J. Vac. Sci. Technol. A, 3 (1985) 592.
8. W.D. Sproul, Surf. Coat. Technol., 33 (1987) 73-81.
9. S. Berg, T. Larsson and H.O. Blom, J. Vac. Sci. Technol. A, 4(3) (1986) 594-597.
10. J. Affinito and R.R. Parsons, J. Vac. Sci. Technol. A, 2(3) (1984) 1275-1284.
11. J.E. Sundgren, B.O. Johansson and S.E. Karlson, Thin Solid Films, 105 (1983) 353-365.
12. T. Larsson, Vacuum, 39(10) (1989) 949-954.
13. T. Abe and T. Yamashina, Thin Solid Films, 30 (1975) 19-27.
14. F. Shinoki and A. Itoh, J. Appl. Phys., Suppl. 2(1) (1974) 505.
15. F. Shinoki and A. Itoh, J. Appl. Phys., 46 (1975) 19.
16. S. Maniv and W.D. Westwood, Surf. Sci., 100 (1980) 108.
17. G. Lemperière, Thèse d'état, Institut des Matériaux, Nantes, France, 1985.
18. S. Maniv and W.D. Westwood, J. Vac.Sci. Technol. 17 (1979) 743.
19. H.D. Hagstrum, Phys. Rev., 104 (1956) 1516.
20. L. Combadiere, Thesis no. 39-1992, l'Université de Limoges, France, 1992.
21. H.F. Winters, J. Appl. Phys., 43 (1972) 4809.
22. H.D. Hagstrum, Surf. Sci., 54 (1976) 197.
23. J.E. Sundgren, B.O. Johansson and S.E. Karlson, Surf. Sci. 128 (1985) 263.
24. H.K. Hu, P.T. Murray, Y. Fukuda and J.W. Rabalais, J. Chem. Phys., 74 (1981) 2247.
25. K. Wasa and S. Hayakawa, Handbook of Sputter Deposition Technology, Noyes Publications, Park Ridge, NJ, USA, 1991.
26. J.P. Noel, D.C. Houghton, G. Este and F.R. Shepherd, J. Vac. Sci. Technol. A, 2(2) (1984) 284-287.
27. C.R. Aita, T.A. Myers and W.J. Larocca, J. Vac. Sci. Technol., 18(2) (1981) 324-327.