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Applied Physics Letters

Volumn 90, Issue 26, 2007, Pages

Lateral variation of target poisoning during reactive magnetron sputtering

(3) Guttler D a Grotzschel R a Moller W a

a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ION IMPLANTATION; MAGNETRON SPUTTERING; MOLECULAR DYNAMICS; NITROGEN; SPUTTER DEPOSITION;

MODEL CALCULATIONS; REACTIVE GAS INCORPORATION; SPUTTER EROSION; TARGET CENTERS;

TITANIUM;

EID: 34547381143 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2752019 Document Type: Article

Times cited : (16)

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