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Contributions to Plasma Physics

Volumn 45, Issue 5-6, 2005, Pages 348-357

Characterization of a magnetron plasma for deposition of titanium oxide and titanium nitride films

(8) Hippler, R a Wrehde, S a Stranak V b Zhigalov, O a Steffen, H a Tichy M c Quaas, M a Wulff, H a

a UNIVERSITY OF GREIFSWALD (Germany)

b UNIVERSITY OF SOUTH BOHEMIA (Czech Republic)

c CHARLES UNIVERSITY (Czech Republic)

Author keywords

Film deposition; Magnetron sputtering; Titanium oxide and nitride

Indexed keywords

ARGON; DEPOSITION; ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; MAGNETRONS; MASS SPECTROMETRY; OXIDE FILMS; TITANIUM NITRIDE;

ELECTRON IONS; ENERGY DISTRIBUTIONS; FILM DEPOSITION; MAGNETRON DISCHARGES; MAGNETRON PLASMAS; MAGNETRON-SPUTTERING; PLASMA IONS; TITANIA OXIDE AND NITRIDE; TITANIUM NITRIDE FILMS; TITANIUM TARGETS;

TITANIUM OXIDES;

EID: 24944522852 PISSN: 08631042 EISSN: None Source Type: Journal
DOI: 10.1002/ctpp.200510040 Document Type: Article

Times cited : (32)

References (12)

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