Reliability of ultra thin ZrO2 films on strained-Si

Microelectronics Reliability

Volumn 48, Issue 5, 2008, Pages 682-692

  Bera, M K ^a   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; FILM THICKNESS; GATE DIELECTRICS; LEAKAGE CURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ZIRCONIA;

CONDUCTION BAND; DETRAPPING BEHAVIOR; PLASMA CAVITY DISCHARGE SYSTEM; STRESS INDUCED LEAKAGE CURRENT (SILC);

ULTRATHIN FILMS;

EID: 43049161340     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2008.01.001     Document Type: Article

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