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Volumn 52, Issue 7, 2005, Pages 1555-1562

Physics-based single-piece charge model for strained-Si MOSFETs

Author keywords

Bulk charge; Charge balance; Compact model; Debye length; Flat band; MOSFET; Potential balance; SiGe; Strained silicon (s Si); Surface potential

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; ELECTRIC POTENTIAL; INTERPOLATION; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

EID: 23944439718     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.850611     Document Type: Article
Times cited : (13)

References (17)
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    • K. Rim, S. Narasimha, M. Longstreet, A. Mocuta, and J. Cai, "Low field mobility characteristics of sub- 100 nm unstrained and strained Si MOSFETs," in IEDM Tech. Dig., 2002, pp. 43-46.
    • (2002) IEDM Tech. Dig. , pp. 43-46
    • Rim, K.1    Narasimha, S.2    Longstreet, M.3    Mocuta, A.4    Cai, J.5
  • 4
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    • "Strained-Si heterostructure field effect transistors"
    • C. K. Maiti, L. K. Bera, and S. Chattopadhyay, "Strained-Si heterostructure field effect transistors," Semicond. Sci. Technol., vol. 13, pp. 1225-1246, 1998.
    • (1998) Semicond. Sci. Technol. , vol.13 , pp. 1225-1246
    • Maiti, C.K.1    Bera, L.K.2    Chattopadhyay, S.3
  • 6
    • 0041513287 scopus 로고    scopus 로고
    • "C-V characterization of strained Si/SiGe multiple heterojunction capacitors as a tool for heterojunction MOSFET channel design"
    • S. Chattopadhyay, K. S. K. Kwa, S. H. Olsen, L. S. Driscoll, and A. G. O'Neil, "C-V characterization of strained Si/SiGe multiple heterojunction capacitors as a tool for heterojunction MOSFET channel design," Semicond. Sci. Technol., vol. 18, pp. 738-744, 2003.
    • (2003) Semicond. Sci. Technol. , vol.18 , pp. 738-744
    • Chattopadhyay, S.1    Kwa, K.S.K.2    Olsen, S.H.3    Driscoll, L.S.4    O'Neil, A.G.5
  • 7
    • 0003232390 scopus 로고
    • "The application of strained silicon/relaxed silicon-germanium heterostructured to metal oxide semiconductor field effect transistors"
    • Ph.D. dissertation, Stanford Univ., Stanford, CA
    • J. J. Welser, "The application of strained silicon/relaxed silicon-germanium heterostructured to metal oxide semiconductor field effect transistors," Ph.D. dissertation, Stanford Univ., Stanford, CA, 1994.
    • (1994)
    • Welser, J.J.1
  • 9
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    • "Physics-based scalable threshold-voltage model for strained-silicon MOSFETs"
    • Boston, MA
    • K. Chandrasekaran, X. Zhou, and S. B. Chiah, "Physics-based scalable threshold-voltage model for strained-silicon MOSFETs," in Proc. NSTI Nanotech, vol. 2, Boston, MA, 2004, pp. 179-182.
    • (2004) Proc. NSTI Nanotech , vol.2 , pp. 179-182
    • Chandrasekaran, K.1    Zhou, X.2    Chiah, S.B.3
  • 11
    • 49949134400 scopus 로고
    • "Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors"
    • H. C. Pao and C. T. Sah, "Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors," Solid-State Electron., vol. 9, pp. 927-937, 1966.
    • (1966) Solid-State Electron. , vol.9 , pp. 927-937
    • Pao, H.C.1    Sah, C.T.2
  • 12
    • 6344252734 scopus 로고    scopus 로고
    • "A physics based analytical surface potential and capacitance model of MOSFETs operation from accumulation to depletion region"
    • San Francisco, CA
    • J. He, X. Xi, M. Chan, K. Cao, A. Niknejad, and C. Hu, "A physics based analytical surface potential and capacitance model of MOSFETs operation from accumulation to depletion region," in Proc. NSTI Nanotech, vol. 2, San Francisco, CA, 2003, pp. 302-305.
    • (2003) Proc. NSTI Nanotech , vol.2 , pp. 302-305
    • He, J.1    Xi, X.2    Chan, M.3    Cao, K.4    Niknejad, A.5    Hu, C.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.