Deposition of mechanically hard amorphous carbon nitride films with high [N] / ([N] + [C]) ratio

Diamond and Related Materials

Volumn 17, Issue 4-5, 2008, Pages 688-691

  Ito, Haruhiko ^a   Kanda, Kazuhiro ^b   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Amorphous carbon nitride; Hardness; IR spectra; Microwave plasma CVD; Raman spectra

Indexed keywords

BIAS VOLTAGE; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; MAGNETRON SPUTTERING; MICROWAVES; RAMAN SCATTERING;

DECOMPOSITION REACTION; MICROWAVE DISCHARGE; STRETCHING VIBRATION;

AMORPHOUS FILMS;

EID: 42949085862     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2007.08.013     Document Type: Article

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