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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4886-4892

Amorphous hydrogenated carbon-nitrogen films deposited by plasma-enhanced chemical vapor deposition

a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO (Brazil)

Author keywords

Amorphous carbon; Carbon nitride; Chemical vapor deposition; Ion implantation; Plasma assisted deposition; Thermal stability

Indexed keywords

AMINES; AMMONIA; ANNEALING; CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; ION IMPLANTATION; NITRIDES; PLASMA APPLICATIONS; RESIDUAL STRESSES; THERMODYNAMIC STABILITY;

CARBON NITRIDE; HYBRIDIZATION; METHYLAMINE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0031176087 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.4886 Document Type: Article

Times cited : (45)

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