Time-dependent deformation behavior of amorphous nitrogen-containing carbon films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 11, 1998, Pages 6102-6106

  Tanaka, Daisuke ^a   Ohshio, Shigeo ^a   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Amorphous nitrogen containing carbon film; Critical force; Hardness; Infrared absorption; Nanoindentation creep; Plasma CVD; Viscous flow; Young's modulus

Indexed keywords

CARBON; CREEP TESTING; ELASTIC MODULI; HARDNESS; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VISCOUS FLOW;

NANOINDENTATION CREEP;

AMORPHOUS FILMS;

EID: 0032204730     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6102     Document Type: Article

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