Deposition of mechanically hard amorphous carbon nitride films from decomposition of BrCN. Effects of substrate cooling and pulsed rf-bias voltage

Journal of Non-Crystalline Solids

Volumn 352, Issue 1, 2006, Pages 1-7

  Ito, H ^a   Hori, K ^a   Saitoh, H ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Chemical vapor deposition; Films and coatings; FTIR measurements; Hardness; Indentation; Microindentation; Nitrogen containing glass; Plasma deposition

Indexed keywords

AMORPHOUS MATERIALS; BROMINE COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COATINGS; COOLING; DECOMPOSITION; ELECTRIC POTENTIAL; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; HARDNESS; INDENTATION; MICROWAVES; PLASMAS;

FILMS AND COATINGS; FTIR MEASUREMENTS; MICROINDENTATION; NITROGEN-CONTAINING GLASS; PLASMA DEPOSITION;

CARBON NITRIDE;

EID: 29244481165     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.015     Document Type: Article

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