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Volumn 451-452, Issue , 2004, Pages 466-469
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Influence of the total gas flow on the deposition of microcrystalline silicon solar cells
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Author keywords
Plasma processing and deposition; Silicon; Solar cells
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Indexed keywords
AMORPHOUS MATERIALS;
DEPOSITION;
DOPING (ADDITIVES);
ELECTROCHEMICAL ELECTRODES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
QUANTUM EFFICIENCY;
SILANES;
SYNTHESIS (CHEMICAL);
GAS FLOW;
MICROCRYSTALLINE SOLAR CELLS;
PLASMA PROCESSING;
SOLAR CELLS;
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EID: 17644448259
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2003.10.128 Document Type: Conference Paper |
Times cited : (31)
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References (12)
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