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Volumn 451-452, Issue , 2004, Pages 466-469

Influence of the total gas flow on the deposition of microcrystalline silicon solar cells

Author keywords

Plasma processing and deposition; Silicon; Solar cells

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM EFFICIENCY; SILANES; SYNTHESIS (CHEMICAL);

EID: 17644448259     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.128     Document Type: Conference Paper
Times cited : (31)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.