-
1
-
-
33845582783
-
3D-SIP integration for autonomous sensor nodes
-
Stoukatch S, Winters C, Beyne E, De Raedt W and Van Hoof C 2006 3D-SIP integration for autonomous sensor nodes Proc. 56th Electronic Components and Technology Conf. (CA, USA,30 May-2 June) pp 404-8
-
(2006)
Proc. 56th Electronic Components and Technology Conf.
, pp. 404-408
-
-
Stoukatch, S.1
Winters, C.2
Beyne, E.3
De Raedt, W.4
Van Hoof, C.5
-
2
-
-
33845595475
-
Assembly technology development for 3D silicon stacked module for handheld products
-
VP G, Lim S, Witarsa D, Yin H W, Kumar M, Lim L A, Yoon S W and Kripesh V 2006 Assembly technology development for 3D silicon stacked module for handheld products Proc. 56th Electronic Components and Technology Conf. (CA, USA, 30 May-2 June) pp 1300-7
-
(2006)
Proc. 56th Electronic Components and Technology Conf.
, pp. 1300-1307
-
-
Vp, G.1
Lim, S.2
Witarsa, D.3
Yin, H.W.4
Kumar, M.5
Lim, L.A.6
Yoon, S.W.7
Kripesh, V.8
-
3
-
-
33845569550
-
Low-cost through-hole electrode interconnection for 3D-SiP using room-temperature bonding
-
Tanaka N and Yoshimura Y 2006 Low-cost through-hole electrode interconnection for 3D-SiP using room-temperature bonding Proc. 56th Electronic Components and Technology Conf. (CA, USA, 30 May-2 June) pp 814-8
-
(2006)
Proc. 56th Electronic Components and Technology Conf.
, pp. 814-818
-
-
Tanaka, N.1
Yoshimura, Y.2
-
4
-
-
33646934683
-
New three-dimensional integration technology using chip-to-wafer bonding to achieve ultimate super-chip integration
-
Fukushima T, Yamada Y, Kikuchi H and Koyanagi M 2006 New three-dimensional integration technology using chip-to-wafer bonding to achieve ultimate super-chip integration Japan. J. Appl. Phys. 45 3030-5
-
(2006)
Japan. J. Appl. Phys.
, vol.45
, pp. 3030-3035
-
-
Fukushima, T.1
Yamada, Y.2
Kikuchi, H.3
Koyanagi, M.4
-
5
-
-
28344456237
-
3D chip stack technology using through-chip interconnects
-
Benkart P, Kaiser A, Munding A, Bschorr M, Pfleiderer H-J, Kohn E, Heittmann A, Huebner H and Ramacher U 2005 3D chip stack technology using through-chip interconnects Design Test Comput IEEE 22 512-8
-
(2005)
Design Test Comput IEEE
, vol.22
, Issue.6
, pp. 512-518
-
-
Benkart, P.1
Kaiser, A.2
Munding, A.3
Bschorr, M.4
Pfleiderer, H.-J.5
Kohn, E.6
Heittmann, A.7
Huebner, H.8
Ramacher, U.9
-
6
-
-
27544480377
-
Stability of wafer level vacuum encapsulated single-crystal silicon resonators
-
Kaajakari V, Kiihamaki J, Oja A, Seppa H, Pietikainen S, Kokkala V and Kuisma H 2005 Stability of wafer level vacuum encapsulated single-crystal silicon resonators Transducers'05 (Seoul, Korea, 5-9 June) pp 916-9
-
(2005)
Transducers'05
, pp. 916-919
-
-
Kaajakari, V.1
Kiihamaki, J.2
Oja, A.3
Seppa, H.4
Pietikainen, S.5
Kokkala, V.6
Kuisma, H.7
-
7
-
-
33645074923
-
Wafer level hermetic package and device testing of a SOI-MEMS switch for biomedical applications
-
Receveur R A M, Zickar M, Marxer C, Larik V and de Rooij N F 2006 Wafer level hermetic package and device testing of a SOI-MEMS switch for biomedical applications J. Micromech. Microeng. 16 676-83
-
(2006)
J. Micromech. Microeng.
, vol.16
, Issue.4
, pp. 676-683
-
-
Receveur, R.A.M.1
Zickar, M.2
Marxer, C.3
Larik, V.4
De Rooij, N.F.5
-
8
-
-
34249662299
-
Implementation of three-dimensional SOI-MEMS wafer-level packaging using through-wafer interconnections
-
Lin C-W, Yang H-A, Wang W C and Fang W 2007 Implementation of three-dimensional SOI-MEMS wafer-level packaging using through-wafer interconnections J. Micromech. Microeng. 17 1200-5
-
(2007)
J. Micromech. Microeng.
, vol.17
, Issue.6
, pp. 1200-1205
-
-
Lin, C.-W.1
Yang, H.-A.2
Wang, W.C.3
Fang, W.4
-
9
-
-
42549155849
-
A generic environment-resistant packaging technology for MEMS
-
Lee S-H, Lee S W and Najafi K 2007 A generic environment-resistant packaging technology for MEMS Transducers'07 (Lyon, France, 10-14 June) pp 335-8
-
(2007)
Transducers'07
, pp. 335-338
-
-
Lee, S.-H.1
Lee, S.W.2
Najafi, K.3
-
10
-
-
50049127815
-
Fabrication of vertical electrodes on channel sidewall for picoliter liquid measurement
-
Wei J, Vander Velden M and Sarro P M 2007 Fabrication of vertical electrodes on channel sidewall for picoliter liquid measurement Transducers'07 (Lyon, France, 10-14 June) pp 1612-6
-
(2007)
Transducers'07
, pp. 1612-1616
-
-
Wei, J.1
Vander Velden, M.2
Sarro, P.M.3
-
11
-
-
34547969120
-
High density through wafer via technology
-
Bauer T 2007 High density through wafer via technology NSTI-Nanotech 2007 (Santa Clara, CA, USA, 20-24 May) pp 116-9
-
(2007)
NSTI-Nanotech 2007
, pp. 116-119
-
-
Bauer, T.1
-
12
-
-
84865112376
-
A novel micromachining technology for structuring borosilicate glass substrates
-
Merz P, Quenzer H J, Bernt H, Wagner B and Zoberbier M 2003 A novel micromachining technology for structuring borosilicate glass substrates Transducers'03 (Boston, USA, 8-12 June) pp 258-61
-
(2003)
Transducers'03
, pp. 258-261
-
-
Merz, P.1
Quenzer, H.J.2
Bernt, H.3
Wagner, B.4
Zoberbier, M.5
-
13
-
-
42549134632
-
Electrical feedthroughs using wafer-level glass-flow technology
-
Fraunhofer ISIT, Itzehoe (DE)
-
Fraunhofer ISIT, Itzehoe (DE) 2005 Electrical feedthroughs using wafer-level glass-flow technology Achievements and Results Annual Report 2005 http://www.isit.fraunhofer.de/german/download/JB2005A4.pdf
-
(2005)
Achievements and Results Annual Report 2005
-
-
-
15
-
-
14244258089
-
A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer
-
Chae J, Kulah H and Najafi K 2005 A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer J. Micromech. Microeng. 15 336-45
-
(2005)
J. Micromech. Microeng.
, vol.15
, Issue.2
, pp. 336-345
-
-
Chae, J.1
Kulah, H.2
Najafi, K.3
-
16
-
-
27144432917
-
A single-crystal silicon symmetrical and decoupled MEMS gyroscope on an insulating substrate
-
Alper S E and Akin T 2005 A single-crystal silicon symmetrical and decoupled MEMS gyroscope on an insulating substrate J. Microelectromech. Syst. 14 707-17
-
(2005)
J. Microelectromech. Syst.
, vol.14
, Issue.4
, pp. 707-717
-
-
Alper, S.E.1
Akin, T.2
-
17
-
-
27144536556
-
A high yield rate MEMS gyroscope with a packaged SiOG process
-
Lee M C, Kang S J, Jung K D, Choa S-H and Cho Y C 2005 A high yield rate MEMS gyroscope with a packaged SiOG process J. Micromech. Microeng. 15 2003-12
-
(2005)
J. Micromech. Microeng.
, vol.15
, Issue.11
, pp. 2003-2012
-
-
Lee, M.C.1
Kang, S.J.2
Jung, K.D.3
Choa, S.-H.4
Cho, Y.C.5
-
18
-
-
42549113193
-
-
MIL-STD-883E, US Department of Defense, 31 Dec. 1996
-
MIL-STD-883E, US Department of Defense, 31 Dec. 1996
-
-
-
-
19
-
-
0035929081
-
Silicon micromachining using a high density plasma source
-
McAuley S A, Ashraf H, Atabo L, Chambers A, Hall S, Hopkins J and Nicholls G 2001 Silicon micromachining using a high density plasma source J. Phys. D: Appl. Phys. 34 2769-73
-
(2001)
J. Phys. D: Appl. Phys.
, vol.34
, Issue.18
, pp. 2769-2773
-
-
McAuley, S.A.1
Ashraf, H.2
Atabo, L.3
Chambers, A.4
Hall, S.5
Hopkins, J.6
Nicholls, G.7
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