Photomask applications of traceable atomic force microscope dimensional metrology at NIST

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Dixson, Ronald ^a   Orji, Ndubuisi G ^a   Potzick, James ^a   Fu, Joseph ^a   Allen, Richard A ^a   Cresswell, Michael ^a   Smith, Stewart ^b   Walton, Anthony J ^b   Tsiamis, Andreas ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

Calibration; CD; CD AFM; Linewidth; Metrology; Reference measurement system; Standards; Traceability

Indexed keywords

PHOTOMASK APPLICATIONS; REFERENCE MEASUREMENT SYSTEM; TRACEABLE MEASUREMENTS;

ATOMIC FORCE MICROSCOPY; MEASUREMENT THEORY; TECHNOLOGY TRANSFER;

STANDARDS;

EID: 42249098689     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746755     Document Type: Conference Paper

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