Updated NIST photomask linewidth standard

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 338-349

  Potzick, James ^a   Pedulla, J Marc ^a   Stocker, Mike ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Linewidth; Metrology; Photomask; Standard; Traceability

Indexed keywords

CAMERAS; IMAGING SYSTEMS; MICROSCOPES; QUARTZ; SCANNING; STANDARDS; STATISTICAL PROCESS CONTROL;

ANTIREFLECTING CHROME; LINEWIDTH; PHOTOMASK; TRACEABILITY;

MASKS;

EID: 0141720421     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487735     Document Type: Conference Paper

References (18)

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15. NIST Photomask Linewidth SRMs 475, and 476 are available from the Office of Standard Reference Materials, NIST, EM 205, Gaithersburg, Md. 20899. Voice 301-975-6776, FAX 301-948-3730. SRM 473 is discontinued.
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