Revisiting mask contact hole measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Higuchi, Masaru ^a   Gallagher, Emily ^b   Ceperley, Daniel ^c   Brunner, Timothy ^b   Bowley, Reg ^b   McGuire, Anne ^b  

^a Toppan Photomasks Inc   (United States)

^b IBM MICROELECTRONICS   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT HOLES; LINE EDGE ROUGHNESS (LER); MASK SENSITIVITIES; REGION OF INTEREST (ROI);

MASKS; NANOTECHNOLOGY; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33846598927     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686957     Document Type: Conference Paper

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