Intercomparison of SEM, AFM, and electrical linewidths

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue II, 1999, Pages 587-598

  Villarrubia, J S ^a   Dixson, R ^a   Jones, S ^a   Lowney, J R ^a   Postek, M T ^a   Allen, R A ^a   Cresswell, M W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ERROR ANALYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MODELS;

ELECTRICAL CRITICAL DIMENSIONS (ECD);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032663981     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350846     Document Type: Conference Paper

References (21)