Study of graded Ni-Ti shape memory alloy film growth on Si(100) substrate

Applied Physics A: Materials Science and Processing

Volumn 91, Issue 2, 2008, Pages 291-299

  Martins, R M S ^a   Schell, N ^b   Mucklich A ^a   Reuther, H ^a   Beckers, M ^a   Silva, R J C ^c   Pereira, L ^c   Braz Fernandes, F M ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

^c DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; FILM GROWTH; X RAY DIFFRACTION ANALYSIS;

NEAR-EQUIATOMIC COMPOSITION; TWO-WAY REVERSIBLE ACTUATION;

SHAPE MEMORY EFFECT;

EID: 40949085553     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4397-2     Document Type: Article

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