Binary and ternary NiTi-based shape memory films deposited by simultaneous sputter deposition from elemental targets

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1425-1429

  Sanjabi, S ^a,b   Cao, Y Z ^c   Sadrnezhaad, S K ^b   Barber, Z H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

^c SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DIFFERENTIAL SCANNING CALORIMETRY; MATHEMATICAL TRANSFORMATIONS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

FILM COMPOSITION; GAS PRESSURE; SHAPE MEMORY FILMS; TERNARY SHAPE;

NICKEL;

EID: 31344469113     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2011404     Document Type: Article

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