In-situ study of Ni-Ti thin film growth on a TiN intermediate layer by X-ray diffraction

Sensors and Actuators, B: Chemical

Volumn 126, Issue 1, 2007, Pages 332-337

  Martins, R M S ^a   Schell, N ^b   Silva, R J C ^c   Pereira, L ^c   Mahesh, K K ^c   Fernandes, F M Braz ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

^c DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

Author keywords

Deposition by sputtering; In situ X ray diffraction; Ni Ti; Shape memory alloy; Texture development

Indexed keywords

SHAPE MEMORY EFFECT; SUBSTRATES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

IN-SITU X-RAY DIFFRACTION; TEXTURE DEVELOPMENT;

THIN FILMS;

EID: 34548474069     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2006.12.052     Document Type: Article

References (20)

1. Johnson A.D. Vacuum-deposited TiNi shape memory film: characterization and applications in microdevices. J. Micromech. Microeng. 1 (1991) 34-41
2. Kahn H., Huff M.A., and Heuer A.H. The TiNi shape-memory alloy and its applications for MEMS. J. Micromech. Microeng. 8 (1998) 213-221
3. Winzek B., Schmitz S., Rumpf H., Sterzl T., Hassdorf R., Thienhaus S., Feydt J., Moske M., and Quandt E. Recent developments in shape memory thin film technology. Mater. Sci. Eng. A 378 (2004) 40-46
4. Ishida A., and Martynov V. Sputter-deposited shape-memory alloy thin films: properties and applications. MRS Bull. 27 (2002) 111-114
5. Miyazaki S., and Ishida A. Martensitic transformation and shape memory behavior in sputter-deposited TiNi-base thin films. Mater. Sci. Eng. A 273-275 (1999) 106-133
6. Fu Y., Du H., Huang W., Zhang S., and Hu M. TiNi-based thin films in MEMS applications: a review. Sens. Actuators A 112 (2004) 395-408
7. 2 substrate. Thin Solid Films 444 (2003) 85-90
8. Shu Y.C., and Bhattacharya K. The influence of texture on the shape-memory effect in polycrystals. Acta Mater. 46 (1998) 5457-5473
9. Martins R.M.S., Fernandes F.M.B., Silva R.J.C., Pereira L., Gordo P.R., Maneira M.J.P., Beckers M., Mücklich A., and Schell N. The influence of a poly-Si intermediate layer on the crystallization behaviour of Ni-Ti SMA magnetron sputtered thin films. Appl. Phys. A 83 (2006) 139-145
10. Lee H.-J., Ni H., Wu D.T., and Ramirez A.G. Experimental determination of kinetic parameters for crystallizing amorphous NiTi thin films. Appl. Phys. Lett. 87 (2005) 114102-1-114102-3
11. Lee H.-J., Ni H., Wu D.T., and Ramirez A.G. Grain size estimations from the direct measurement of nucleation and growth. Appl. Phys. Lett. 87 (2005) 124102-1-124102-3
12. Matz W., Schell N., Bernhard G., Prokert F., Reich T., Claußner J., Oehme W., Schlenk R., Dienel S., Funke H., Eichhorn F., Betzl M., Pröhl D., Strauch U., Hüttig G., Krug H., Neumann W., Brendler V., Reichel P., Denecke M.A., and Nitsche H. ROBL-a CRG beamline for radiochemistry and materials research at the ESRF. J. Synchroton Radiat. 6 (1999) 1076-1085
13. Schell N., Martins R.M.S., and Fernandes F.M.B. Real-time and in-situ structural design of functional NiTi SMA thin films. Appl. Phys. A 81 (2005) 1441-1445
14. Martins R.M.S., Schell N., Silva R.J.C., and Fernandes F.M.B. Structural in situ studies of shape memory alloy (SMA) Ni-Ti thin films. Nucl. Instr. Meth. B 238 (2005) 319-322
15. Martins R.M.S., Fernandes F.M.B., Silva R.J.C., Beckers M., and Schell N. In-situ observation of Ni-Ti thin film growth by synchrotron radiation scattering. Mater. Sci. Forum 514-516 (2006) 1588-1592
16. 2 buffer layer. Appl. Phys. A 84 (2006) 285-289
17. Gall D., Kodambaka S., Wall M.A., Petrov I., and Greene J.E. Pathways of atomistic processes on TiN(0 0 1) and (1 1 1) surfaces during film growth: an ab initio study. J. Appl. Phys. 93 (2003) 9086-9094
18. Schell N., Matz W., Bøttiger J., Chevallier J., and Kringhøj P. Development of texture in TiN films by use of in situ synchrotron X-ray scattering. J. Appl. Phys. 91 (2002) 2037-2044
19. Matz W., Schell N., Neumann W., Bøttiger J., and Chevallier J. A two magnetron sputter deposition chamber for in situ observation of thin film growth by synchrotron radiation scattering. Rev. Sci. Instrum. 72 (2001) 3344-3348
20. Zhang J.-M., Ma F., and Xu K.-W. Calculation of the surface energy of bcc metals by using the modified embedded-atom method. Surf. Interface Anal. 35 (2003) 662-666