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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2382-2387

Dependence of compositions and crystallization behaviors of dc-sputtered TiNi thin films on the deposition conditions

(2) Ting, J M a Chen, P a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS ALLOYS; COMPOSITION EFFECTS; CRYSTALLINE MATERIALS; DIFFERENTIAL SCANNING CALORIMETRY; FILM PREPARATION; GRAIN SIZE AND SHAPE; PRESSURE EFFECTS; RATE CONSTANTS; RESIDUAL STRESSES; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; SUBSTRATES; TIN ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

KISSINGER METHOD;

THIN FILMS;

EID: 0035440815 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1385905 Document Type: Article

Times cited : (10)

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