Fabrication of Cu nanowires at predetermined positions by utilising stress migration

Strain

Volumn 44, Issue 2, 2008, Pages 201-208

  Settsu, N ^a   Saka, M ^a   Yamaya, F ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Hydrostatic stress; Nanowire; Oxide layer; Stress migration; Weak spot

Indexed keywords

ATOMS; FINITE ELEMENT METHOD; NANOWIRES; STRESS CONCENTRATION;

ATOMIC FLUX; HYDROSTATIC STRESS GRADIENT; STRESS MIGRATION;

COPPER;

EID: 40749110945     PISSN: 00392103     EISSN: 14751305     Source Type: Journal    
DOI: 10.1111/j.1475-1305.2007.00370.x     Document Type: Article

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