Fabrication of Al thin wire by utilizing controlled accumulation of atoms due to electromigration

Materials Letters

Volumn 60, Issue 17-18, 2006, Pages 2129-2131

  Saka, M ^a   Nakanishi, R ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Drift; Electromigration; Nanomaterials; Thin films; Thin wire

Indexed keywords

ATOMS; CURRENT DENSITY; DIFFUSION; ELECTROMIGRATION; ELECTRONS; THIN FILMS;

DRIFT; ELECTRON FLOW; NANOMATERIALS; THIN WIRE;

ALUMINUM;

EID: 33646558922     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.12.107     Document Type: Article

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