Vapor-liquid-solid growth of silicon nanowires by chemical vapor deposition on implanted templates

Journal of Applied Physics

Volumn 100, Issue 8, 2006, Pages

  Christiansen, S ^b   Schneider, R ^a   Scholz, R ^b   Gosele U ^b   Stelzner, Th ^c,d   Andra G ^c   Wendler, E ^d   Wesch, W ^d  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^d FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; AMORPHOUS SILICON; DIFFUSION; SEMICONDUCTOR GROWTH; SILICON WAFERS;

SILICON NANOWIRES; SUPERCRITICAL METAL NANOPARTICLES; VAPOR LIQUID SOLID GROWTH; WAFER SURFACE;

NANOSTRUCTURED MATERIALS;

EID: 33750532353     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357342     Document Type: Article

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