Electromigration in layered Al lines studied by in-situ ultra-high voltage electron microscopy

Thin Solid Films

Volumn 300, Issue 1-2, 1997, Pages 25-29

  Mori, H ^a   Okabayashi, H ^b   Komatsu, M ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

Aluminium; Electromigration; Electron diffraction; Electron microscopy

Indexed keywords

ALUMINUM; CRYSTAL STRUCTURE; CRYSTAL WHISKERS; ELECTRON DIFFRACTION; FILM GROWTH; INTEGRATED CIRCUIT MANUFACTURE; SEMICONDUCTING SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; VELOCITY MEASUREMENT;

ELECTROMIGRATION; VOIDS;

METALLIC FILMS;

EID: 0031140028     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09517-X     Document Type: Article

References (8)

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