Simulation of an Ar/Cl2 inductively coupled plasma: Study of the effect of bias, power and pressure and comparison with experiments

Journal of Physics D: Applied Physics

Volumn 41, Issue 6, 2008, Pages

  Tinck, S ^a,b   Boullart, W ^b   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; ETCHING; MATHEMATICAL MODELS; PLASMA DEVICES;

GAS PRESSURE; HYBRID PLASMA EQUIPMENT MODEL;

INDUCTIVELY COUPLED PLASMA;

EID: 40549133483     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/6/065207     Document Type: Article

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