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Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 313-317

The etching properties of MgO thin films in Cl2/Ar gas chemistry

(4) Gu, Sung Mo a Kim, Dong Pyo a Kim, Kyoung Tae a Kim, Chang Il a

a Chung Ang University (South Korea)

Author keywords

Etching; Langmuir; MgO; OES

Indexed keywords

ARGON; CHLORINE; ELECTRIC BREAKDOWN; ELECTRIC POTENTIAL; ETCHING; LANGMUIR BLODGETT FILMS; LEAKAGE CURRENTS; MAGNESIA; PERMITTIVITY; PLASMA DIAGNOSTICS; RANDOM ACCESS STORAGE;

DYNAMIC RANDOM-ACCESS MEMORY (DRAM); MGO; NONDESTRUCTIVE READOUT (NDRO); OES;

THIN FILMS;

EID: 13444269209 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.08.037 Document Type: Conference Paper

Times cited : (10)

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