Pulsed plasma deposition of chromium oxide/chromium-cermet coatings

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 374-379

  Gall, D ^a   Gampp, R ^a   Lang, H P ^a   Oelhafen, P ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CERMETS; CHROMIUM; CHROMIUM COMPOUNDS; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDATION; PLASMA APPLICATIONS; SPUTTER DEPOSITION; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CERMET COATINGS; CHROMIUM OXIDE; EX SITU; IN SITU; PULSED PLASMA DEPOSITION;

COATINGS;

EID: 0030107344     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580092     Document Type: Article

References (21)

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