-
1
-
-
33644986679
-
-
U.S. Patent 4,428,811, January 31
-
W.D. Sproul and J.R. Tomashek, U.S. Patent 4,428,811, "Rapid Rate Reactive Sputtering of a Group IVB Metal," January 31, 1984.
-
(1984)
Rapid Rate Reactive Sputtering of A Group IVB Metal
-
-
Sproul, W.D.1
Tomashek, J.R.2
-
2
-
-
0023457156
-
Reactive D.C. high-rate sputtering as production technology
-
S. Schiller, U. Heisig, Chr. Korndörfer, G. Beister, J. Reschke, K. Steinfelder, and J. Strümpfel, "Reactive D.C. High-Rate Sputtering as Production Technology," Surf. Coat. Technol., 33, 405, 1987.
-
(1987)
Surf. Coat. Technol.
, vol.33
, pp. 405
-
-
Schiller, S.1
Heisig, U.2
Korndörfer, C.3
Beister, G.4
Reschke, J.5
Steinfelder, K.6
Strümpfel, J.7
-
3
-
-
0031348883
-
Reactive dual magnetron sputtering of oxides for large area production of optical multilayers
-
J. Strümpfel, G. Beister, D. Schulze, M. Kammer and St. Rehn, "Reactive Dual Magnetron Sputtering of Oxides for Large Area Production of Optical Multilayers," 40th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 179, 1997.
-
(1997)
40th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 179
-
-
Strümpfel, J.1
Beister, G.2
Schulze, D.3
Kammer, M.4
Rehn, S.5
-
4
-
-
84858553540
-
Flexible reactive gas sputtering process control
-
V. Bellido-González, B. Daniel, J. Counsell, and M. Stevens, "Flexible Reactive Gas Sputtering Process Control," 47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 44, 2004.
-
(2004)
47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 44
-
-
Bellido-González, V.1
Daniel, B.2
Counsell, J.3
Stevens, M.4
-
6
-
-
0011249777
-
Properties of Hf-based oxide and oxynitride thin films
-
Santa Clara, CA, February 11-14
-
M.R. Visokay, J.J. Chambers, A.L.P. Rotondaro, R. Kuan, L. Tsung, M. Douglas, H. Bu, A. Shanware, and L. Colombo, "Properties of Hf-Based Oxide and Oxynitride Thin Films," Proceedings of the 2002 AVS 3rd International Conference on Micro-electronics and Interfaces, Santa Clara, CA, p. 127, February 11-14, 2002.
-
(2002)
Proceedings of the 2002 AVS 3rd International Conference on Micro-electronics and Interfaces
, pp. 127
-
-
Visokay, M.R.1
Chambers, J.J.2
Rotondaro, A.L.P.3
Kuan, R.4
Tsung, L.5
Douglas, M.6
Bu, H.7
Shanware, A.8
Colombo, L.9
-
7
-
-
0032122139
-
Magnetron sputtering of aluminum using oxygen or nitrogen as reactive gas
-
J. Schulte and G. Sobe, "Magnetron Sputtering of Aluminum Using Oxygen or Nitrogen as Reactive Gas," Thin Solid Films, 324, 19, 1998.
-
(1998)
Thin Solid Films
, vol.324
, pp. 19
-
-
Schulte, J.1
Sobe, G.2
-
8
-
-
0030110257
-
Effect of the nature of the working gas on the D.C. sputter deposition of chromium nitride and ox-nitride thin films on steel substrates
-
J. Baborowski. M. Charbonnier, and M. Romand, "Effect of the Nature of the Working Gas on the D.C. Sputter Deposition of Chromium Nitride and Ox-Nitride Thin Films on Steel Substrates," Surf. Coat. Technol, 80, 190, 1996.
-
(1996)
Surf. Coat. Technol
, vol.80
, pp. 190
-
-
Baborowski, J.1
Charbonnier, M.2
Romand, M.3
-
9
-
-
0035858515
-
Refractive index of sputtered silicon oxynitride layers for antireflection coating
-
M. Serényi, M. Rácz, and T. Lohner, "Refractive Index of Sputtered Silicon Oxynitride Layers for Antireflection Coating," Vacuum, 61, 245, 2001.
-
(2001)
Vacuum
, vol.61
, pp. 245
-
-
Serényi, M.1
Rácz, M.2
Lohner, T.3
-
10
-
-
0242353775
-
Control of the reactive sputtering process using two reactive gases
-
W.D. Sproul, D.J. Christie, D.C. Carter, S. Berg, and T. Nyberg, "Control of the Reactive Sputtering Process Using Two Reactive Gases," 46th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 98, 2003.
-
(2003)
46th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 98
-
-
Sproul, W.D.1
Christie, D.J.2
Carter, D.C.3
Berg, S.4
Nyberg, T.5
-
11
-
-
33644980089
-
Effective closed-loop control for reactive sputtering using two reactive gases
-
D.C. Carter, W.D. Sproul and, D.J. Christie, "Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases, 47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 37, 2004.
-
(2004)
47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 37
-
-
Carter, D.C.1
Sproul, W.D.2
Christie, D.J.3
-
12
-
-
33746945021
-
Reactive sputtering using two reactive gases. experiments and computer modeling
-
P. Carlsson, C. Nender, H. Barankova, and S. Berg, "Reactive Sputtering Using Two Reactive Gases. Experiments and Computer Modeling," J. Vac. Sci. Technol. A, 11(4), 1534, 1993.
-
(1993)
J. Vac. Sci. Technol. A
, vol.11
, Issue.4
, pp. 1534
-
-
Carlsson, P.1
Nender, C.2
Barankova, H.3
Berg, S.4
-
13
-
-
34247599237
-
Hysteresis effects in the sputtering process using two reactive gases
-
H. Barankova, S. Berg, P. Carlsson, and C. Nender, "Hysteresis Effects in the Sputtering Process Using Two Reactive Gases," Thin Solid Films, 260, 181, 1995.
-
(1995)
Thin Solid Films
, vol.260
, pp. 181
-
-
Barankova, H.1
Berg, S.2
Carlsson, P.3
Nender, C.4
-
14
-
-
4243393213
-
Modeling of mass transport and gas kinetics of the reactive sputtering process
-
S. Berg and C. Nender, "Modeling of Mass Transport and Gas Kinetics of the Reactive Sputtering Process," Journal de Physique IV, Colloque C5, supplément au Journal de Physique II, 5, C5/45, 1995.
-
(1995)
Journal de Physique IV, Colloque C5, Supplément Au Journal de Physique II
, vol.5
-
-
Berg, S.1
Nender, C.2
-
15
-
-
0035208548
-
Gas inlet systems for large area linear magnetron sputtering sources
-
F. Milde, G. Teschner, and C. May, "Gas Inlet Systems for Large Area Linear Magnetron Sputtering Sources," 44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 204, 2001.
-
(2001)
44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 204
-
-
Milde, F.1
Teschner, G.2
May, C.3
-
16
-
-
0035387766
-
Enhanced sputtering of titanium oxide, nitride, and oxynitride thin films by the reactive gas pulsing technique
-
N. Martin, R. Sanjinés, J. Takadoum, and F. Levy, "Enhanced Sputtering of Titanium Oxide, Nitride, and Oxynitride Thin Films by the Reactive Gas Pulsing Technique," Surf. Coat. Technol, 142, 615, 2001.
-
(2001)
Surf. Coat. Technol
, vol.142
, pp. 615
-
-
Martin, N.1
Sanjinés, R.2
Takadoum, J.3
Levy, F.4
-
17
-
-
0035965965
-
y thin films sputter deposited by the reactive gas pulsing technique
-
y Thin Films Sputter Deposited by the Reactive Gas Pulsing Technique," Applied Surface Science, 185, 123, 2001.
-
(2001)
Applied Surface Science
, vol.185
, pp. 123
-
-
Martin, N.1
Banakh, O.2
Santo, A.M.E.3
Springer, S.4
Sanjinés, R.R.5
Takadoum, J.6
Lévy, F.7
-
18
-
-
0036641695
-
Optical properties and local atomic order in non-hydrogenated amorphous silicon carbonitride films
-
J. Dixmier, B. Doucey, M. Cuniot, R. Moudni, F. Tenegal, J.E. Bouree, D. Imhoff, and M. Rommeluere, "Optical Properties and Local Atomic Order in Non-Hydrogenated Amorphous Silicon Carbonitride Films," Journal of Materials Science, 37 (13), 2737, 2002.
-
(2002)
Journal of Materials Science
, vol.37
, Issue.13
, pp. 2737
-
-
Dixmier, J.1
Doucey, B.2
Cuniot, M.3
Moudni, R.4
Tenegal, F.5
Bouree, J.E.6
Imhoff, D.7
Rommeluere, M.8
-
19
-
-
0034817843
-
Relation between local composition, chemical environment and phase shift behavior in Cr-based oxycarbonitride thin films
-
J.R. Smith, P.C.J. Graat, D.A. Bonnell, R.H. French, "Relation between Local Composition, Chemical Environment and Phase Shift Behavior in Cr-Based Oxycarbonitride Thin Films," Materials Research Society Symposium Proceedings, 636, p. D531, 2001.
-
(2001)
Materials Research Society Symposium Proceedings
, vol.636
-
-
Smith, J.R.1
Graat, P.C.J.2
Bonnell, D.A.3
French, R.H.4
-
20
-
-
0032613370
-
In-situ optical measurements of transmittance, and reflectance by ellipsometry on glass, strips and webs in large area coating plants
-
J. Strümpfel, C. Melde, E. Reinhold, and J. Richter, "In-Situ Optical Measurements of Transmittance, and Reflectance by Ellipsometry on Glass, Strips and Webs in Large Area Coating Plants," 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 280, 1999.
-
(1999)
42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters
, pp. 280
-
-
Strümpfel, J.1
Melde, C.2
Reinhold, E.3
Richter, J.4
|