Characterization of sputter-deposited chromium nitride thin films for hard coatings

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 398-402

  Hones, P ^a   Sanjines, R ^a   Levy F ^a  

^a EPFL   (Switzerland)

Author keywords

Chemical composition; Chromium nitride; Coating properties; Dielectric function

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; DIELECTRIC PROPERTIES OF SOLIDS; ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; NITRIDES; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM NITRIDE; ELECTRON PROBE MICROANALYSIS; MICROINDENTATION; SPECTROSCOPIC ELLIPSOMETRY;

PROTECTIVE COATINGS;

EID: 0031246458     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00443-X     Document Type: Article

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