Particle simulation of a magnetically enhanced dual-frequency capacitively coupled plasma

Journal of Physics D: Applied Physics

Volumn 41, Issue 1, 2008, Pages

  Kim, D H ^a   Ryu, C M ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DISTRIBUTION FUNCTIONS; MAGNETIC FIELDS; MONTE CARLO METHODS; PLASMA DENSITY; PLASMA SHEATHS; PLASMA SIMULATION;

HIGH-FREQUENCY-AVERAGED SHEATH POTENTIAL; ION-ENERGY-DISTRIBUTION FUNCTIONS (IEDF); PARTICLE SIMULATION;

INDUCTIVELY COUPLED PLASMA;

EID: 38549131446     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/1/015207     Document Type: Article

References (27)

1. Lowe H-D, Goto H and Ohmi T 1991 J. Vac. Sci. Technol. A 9 3090-99
2. Goto H H, Lowe H-D and Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048-54
3. Kitajima T, Takeo Y and Makabe T 1999 J. Vac. Sci. Technol. A 17 2510-16
4. Kitajima T, Takeo Y, Petrovic Z Lj and Makabe T 2000 Appl. Phys. Lett. 77 489-91
5. Kim H C, Lee J K and Shon J W 2003 Phys. Plasmas 10 4545-51
6. Robiche J, Boyle P C, Turner M M and Ellingboe A R 2003 J. Phys. D: Appl. Phys. 36 1810-6
7. Boyle P C, Robiche J and Turner M M 2004 J. Phys. D: Appl. Phys. 37 1451-8
8. Shannon S, Hoffman D, Yang J-G, Paterson A and Holland J 2005 J. Appl. Phys. 97 103304-4
9. Shannon S, Hoffman D, Yang J-G and Godyak V 2005 Int. Symp. on Dry Process (Jeju, Korea) Abstract 10-53
10. Lieberman M A, Lichtenberg A J and Saves S E 1991 IEEE Trans. Plasma Sci. 19 189-96
11. Park J-C and Kang B 1997 IEEE Trans. Plasma Sci. 25 499-506
12. Kushner M J 2003 J. Appl. Phys. 94 1436-47
13. Birdsall C K 1991 IEEE Trans. Plasma Sci. 19 65-85
14. Alves M V, Lieberman M A, Vahedi V and Birdsall C K 1991 J. Appl. Phys. 69 3823-29
15. Lee J K, Babaeva N Yu, Kim H C, Manuilenko O V and Shon J W 2004 IEEE Trans. Plasma Sci. 32 47-53
16. Lee J K, Manuilenko O V, Babaeva N Yu, Kim H C and Shon J W 2005 Plasma Sources Sci. Technol. 14 89-97
17. Wild C and Koidl P 1991 J. Appl. Phys. 69 2909-22
18. Karkari S K and Ellingboe A R 2006 Appl. Phys. Lett. 88 101501-3
19. You S J and Chang H Y 2006 Phys. Plasmas 13 043503-5
20. Tsendin L D 1982 Sov. J. Plasma Phys. 8 96-100
21. Turner M M, Hutchinson D A W, Doyle R A and Hopkins M B 1996 Phys. Rev. Lett. 76 2069-72
22. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
23. Rauf S 2005 Plasma Sources Sci. Technol. 14 329-35
24. Godyak V A and Piejak R B 1990 Phys. Rev. Lett. 65 996-99
25. Kawamura E, Vahedi V, Lieberman M A and Birdsall C K 1999 Plasma Sources Sci. Technol. 8 R45-64
26. Georgieva V, Bogaerts and Gijbels R 2004 Phys. Rev. E 69 026406-11
27. Kushner M J and Yang Y 2005 Int. Sym. on Dry Process (Jeju, Korea) Abstract 3-02